Alexandria Digital Research Library

Modeling, Design, and Fabrication of Carbon Nanostructures for Next-Generation Integrated Circuit Interconnects and Passive Devices

Author:
Li, Hong
Degree Grantor:
University of California, Santa Barbara. Electrical & Computer Engineering
Degree Supervisor:
Kaustav Banerjee
Place of Publication:
[Santa Barbara, Calif.]
Publisher:
University of California, Santa Barbara
Creation Date:
2012
Issued Date:
2012
Topics:
Nanotechnology, Engineering, Electronics and Electrical, and Engineering, Computer
Keywords:
Passive
Graphene
Carbon Nanotube
Interconnect
VLSI
Integrated Circuits
Genres:
Dissertations, Academic and Online resources
Dissertation:
Ph.D.--University of California, Santa Barbara, 2012
Description:

The semiconductor industry is confronting an acute problem in the interconnect area--as IC feature sizes continue to be scaled below 22 nm, Cu wires exhibit significant "size effects" resulting in a sharp rise in their resistivity, which in turn has adverse impact both on IC performance and reliability -- in the form of higher communication costs due to increased interconnect delays and chip-level power dissipation, as well as reduced current carrying capacity of the wires. Additionally, designing low-loss and high-quality passive structures becomes increasingly difficult for ultra high-frequency/RF or Terahertz applications. This dissertation explores the feasibility of using carbon nanomaterials such as carbon nanotubes (CNT) and graphene as next-generation interconnects and passive devices to address some of the key performance, energy-efficiency and reliability challenges facing the IC industry--from modeling, design, as well as fabrication perspectives.

On the modeling and design front, this dissertation presents the first and foremost attempt to build a compact circuit model for double/multi-walled CNT interconnects, based on which, the performance of CNT interconnects are analyzed and compared with that of Cu, showing the potential for 50% savings in both delay and power. We are also the first to theoretically illustrate that carbon based interconnects exhibit unique high-frequency behavior in the form of reduced skin effect, which shows great promise for designing low-loss ultra high-frequency interconnects/passive devices and circuits. Moreover, we propose a unique CNT based capacitor design that provides over 4X capacitance density than that required by the International Technology Roadmap for Semiconductors (ITRS) for the year 2014. In addition, we provide the first comprehensive evaluation of CNT vias that are being heavily researched by the semiconductor R&D community, and quantify their impact on the performance and thermal management of the back-end of the chip. En route, we bring forward the key process design requirements for CNT vias.

On the fabrication front, this dissertation presents a novel process that, for the first time, enables fabrication of high-density, long (over 100 microns) and thick (up to microns) horizontally aligned CNT interconnects. The developed process not only yields horizontal CNT interconnects with the lowest reported resistivity, but also enables the first ever fabrication of a CNT based on-chip inductor. Finally, this dissertation includes a first-time study of electrostatic discharge characterization of few-layer graphene (relevant for both active and passive devices), and demonstrates the exceptional robustness of graphene with achieved current density as high as 4.6x108 A/ cm 2.

Physical Description:
1 online resource (230 pages)
Format:
Text
Collection(s):
UCSB electronic theses and dissertations
ARK:
ark:/48907/f3v122qw
ISBN:
9781267767684
Catalog System Number:
990039147750203776
Rights:
Inc.icon only.dark In Copyright
Copyright Holder:
Hong Li
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